TSKgel Phenyl-3PW (20)
TSKgel® Phenyl-3PW (20) resin is a hydrophobic interaction chromatography (HIC) resin designed for oligonucleotide purification.
Brand: TSKgel
Manufacturers:
Description
TSKgel® Phenyl-3PW (20) resin is a hydrophobic interaction chromatography (HIC) resin designed for oligonucleotide purification. This resin features phenyl group ligands functionalized on a 20 µm polymethacrylate base particle with 25 nm pores, which binds approximately 2.5 times more oligonucleotides than TSKgel Phenyl-5PW.
TSKgel Phenyl-3PW (20) resin efficiently purifies oligonucleotides with both DMT and MMT protection groups, ensuring high purity and yield. Its versatility reduces the need for multiple resins, streamlining processes for manufacturers and improving process economics.
TSKgel PW resins’ high degree of crosslinking results in high chemical and mechanical stability, allowing rigorous cleaning-in-place (CIP) and fast flow rates.
Specifications
| Particle Size (µm) | 20 |
|---|---|
| Pore Size (nm) | 25 |
| Process Step | Polishing |
| Resin Volume | 50 L, 5 L, 25 mL, 1 L, 25 L, 250 mL |
| Mode | Hydrophobic Interaction |
| Applications | Oligonucleotides |
| Documents Available | Technical Document, Functional Document |